IEEE

Elimination of Pinhole Defects in Self-Aligned Double Patterning Process by using Bias Pulsed Plasma

Abstract: Self-aligned double patterning (SADP) is extensively utilized in advanced sub-20nm technology nodes. The DRAM digit contact SADP dry etch process experienced severe yield loss due to pinhole ...
Diginomica

How Create Music Group strikes the right note by placing data at the heart of the music-streaming process

As seen on diginomica passim, the music industry has a complicated relationship with data and AI. While there’s justifiable concern that emerging technology can be used to shortcut the creative ...
IEEE

Adaptive Two-Stage Model for Bearing Remaining Useful Life Prediction Using Gaussian Process Regression With Matched Kernels

Abstract: Stemming from complex mechanisms and working conditions of bearings, single degradation models often fail to adequately describe complex degradation process and provide reliable prediction ...