Photomasks are becoming more complex at each node. In fact, masks are moving from traditional shapes to non-orthogonal patterns and complex shapes, such as curvilinear mask patterns. To measure ...

Abstract: Curvilinear (CL) mask patterns, essential for extreme ultraviolet lithography in advanced semiconductor manufacturing, suffer from degraded fidelity and contrast due to complex pattern ...

Abstract: Precision positioning measurement technology based on microvision has important applications in high-end manufacturing fields such as semiconductors and machine tools. Currently, measurement ...