Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.
JoAnne Klimovich Harrop Monday, May 16, 2022 3:43 p.m. | Monday, May 16, 2022 3:43 p.m. The people in these images truly are men and women of steel. They are individuals who labored to create the ...
Design for manufacturability (DFM) is a hot topic for designers contemplating a move to advanced silicon processes. Fortunately, the foundries are a step ahead of them. TSMC has rolled out two ...
SAN JOSE, Calif.--(BUSINESS WIRE)--Cadence Design Systems, Inc. (Nasdaq: CDNS) today announced that its custom and analog/mixed-signal (AMS) IC design flow has achieved certification for Samsung ...
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